The NICO AURA Nanobubble System utilizes ultra-fine nanobubbles, approximately 250 times smaller than skin pores and 400 times smaller than a human hair, to deliver oxygen-rich water for health, wellness, and therapeutic applications.
It ensures stable nanobubble generation, enhanced cleaning efficiency, and consistent dissolved oxygen levels while maintaining high-purity standards.
Enhancing ultra-pure water performance with advanced
nanobubble technology.
Enhances particle removal and surface cleanliness in high-precision wafer processes.
Improves water quality by supporting stable, high-purity polishing processes.
Ensures efficient, residue-free cleaning of sensitive electronic components.
Enables high-performance cleaning without introducing chemical contaminants.
Maintains clarity and accuracy by delivering ultra-clean, non-damaging cleaning.
Supports effective oxidation processes while leaving no harmful residues behind.
Measurable improvements in ultra-pure water quality, process stability,
and system performance.
Delivers ultra-fine nanobubbles for precise oxygen control with zero ionic contamination.
Eliminates the need for additives while reducing dependence on chemical oxidants.
Improves micro-surface cleaning efficiency for high-precision applications.
Maintains consistent dissolved oxygen levels and integrates seamlessly with DI and ultrapure water systems.
Compare models to find the right NICO VANTA system for your ultra-pure water requirements.
| Models | Units | NICO VANTA 05 | NICO VANTA 30 |
|---|---|---|---|
| Flow Rate | m³/hr | 5 | 26 |
| LPH | 5000 | 26000 | |
| System Pressure | bar | 2-2.5 | 2.5-3 |
| Nanobubble Size | nm | 50-200 | 50-200 |
| Zeta potential | mV | up to -43 mV | up to -43 mV |
| Gas usage | Oxygen, Ozone | ||
| Oxygen Flow Rate | LPM | 2 | 8 |
| Oxygen Pressure | PSI | >7 | >7 |
| Ozone Flow Rate | GPH | 8 | 17 |
| Ozone Pressure | PSI | < 1.1-1.2 | < 1.1-1.2 |
| Suction Line Size | inch | 1.0 | 2.5 |
| Discharge Line Size | inch | 1.0 | 2.0 |
| System power | kW | 0.75 | 5.5 |
The system delivers controlled, chemical-free oxygenation using nanobubbles with zero ionic contamination, ensuring it maintains the integrity and resistivity standards of ultra-pure water systems.
Yes, it is fully compatible with DI and ultra-pure water loops and can be seamlessly integrated into semiconductor, pharmaceutical, and precision manufacturing processes.
It enhances micro-surface cleaning, supports advanced oxidation without chemical residues, and maintains stable dissolved oxygen levels, reducing reliance on chemical oxidants and improving overall system performance.
